3D nanostructures from NIL and self-folding
Nanoimprint lithography (NIL) has with very high resulition (a few nanometers), highly parallel, and low cost (compared with EBL), suitable for large-scale manufacturing. NIL can be used to pattern nanoscale features on metal, semiconductors and polymers with high efficiency.
Nanoscale NIL patterns with various materials
Self-folding microstructures with nanoscale patterns on the surface can be used for artificial scaffolds for tissue engineering, plasmonic waveguides, and nanofluidic devices.
3D Structures with NIL patterns through self-folding